Kinetic Processes and Phase-transition of CVD Processes for Ti2SiC3

نویسندگان

  • Jürgen Geiser
  • Robert Röhle
چکیده

Abstract In this paper we present a kinetic model based on numerical simulations of a chemical vapor deposition (CVD) process. We discuss a model that is based on kinetics of the deposition rates to the material. Such a kinetic model helps to explain the experimental results and reduce expensive real-life studies. We concentrate on experiments with 3 2 Ti SiC and we verify our model based on temperature dependent kinetic processes.

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عنوان ژورنال:
  • JCIT

دوره 5  شماره 

صفحات  -

تاریخ انتشار 2010